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Innovating Vacuum technology Worldwide
·Expandable to vacuum interconnection system
·Cost-effective with lower operating costs
·Supports 4"single wafer or 3x2" wafers, with an optional upgrade to 6" wafer
·Simple design and compact structure, saving laboratory space
·High versatility, suitable for compound semiconductor R&D and small-batch production
·Wholly independent professional growth control software with high reliability and minimal defect time, leading to lower parts replacement costs.
·Up to 12 effusion cells with instantaneous shutter control, high flexibility of growth process, and precise growth of complex structure film.
Specification
|
MBE system |
FW60 |
|
Wafer |
4" / 3x2"( optional to 6") |
|
Substrate heater |
1050℃ |
|
Chamber |
3 |
|
Application |
III-V, II-VI, Si, Ge, Oxides, |
|
In-situ characterization |
BFM, QCM, RGA， RHEED |
|
Source |
12 |
|
Source Shutter |
Pneumatic actuators |
|
Source Temperature |
1400±0.1℃ |
|
Thickness uniformity |
≤ ±1.5% |
Epitaxial process indicators with test structure
Effusion Cell
TEL：024-23826855
E-mail：sales@sky.ac.cn
Address：No.1 Xinyuan Street, Hunnan District, Shenyang City, China
Copyright (C) SKY Technology Development Co., Ltd. Chinese Academy of Sciences
辽ICP备19006370号-1 Power by 300.cn shenyang
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